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US Patent Issued to Tokyo Electron on April 14 for "Method and apparatus for in-situ dry development" (New York Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,710, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Method and apparatus for in-situ dry development" was invented by S... और पढ़ें


US Patent Issued to Tokyo Electron on April 14 for "Method and apparatus for in-situ dry development" (New York Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,710, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Method and apparatus for in-situ dry development" was invented by S... और पढ़ें


US Patent Issued to NANYA TECHNOLOGY on April 14 for "Semiconductor device and manufacturing method thereof" (Taiwanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,711, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Semiconductor device and manufacturing method ... और पढ़ें


US Patent Issued to NANYA TECHNOLOGY on April 14 for "Semiconductor device and manufacturing method thereof" (Taiwanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,711, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Semiconductor device and manufacturing method ... और पढ़ें


US Patent Issued to NANYA TECHNOLOGY on April 14 for "Method of forming mask with reduced feature sizes" (Taiwanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,712, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Method of forming mask with reduced feature si... और पढ़ें


US Patent Issued to NANYA TECHNOLOGY on April 14 for "Method of forming mask with reduced feature sizes" (Taiwanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,712, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Method of forming mask with reduced feature si... और पढ़ें


US Patent Issued to NANYA TECHNOLOGY on April 14 for "Method of forming mask with reduced feature sizes" (Taiwanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,713, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Method of forming mask with reduced feature si... और पढ़ें


US Patent Issued to NANYA TECHNOLOGY on April 14 for "Method of forming mask with reduced feature sizes" (Taiwanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,713, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Method of forming mask with reduced feature si... और पढ़ें


US Patent Issued to DISCO on April 14 for "Lift-off method" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,714, issued on April 14, was assigned to DISCO Corp. (Tokyo). "Lift-off method" was invented by Masato Terajima (Tokyo), Junya Mimura (Tok... और पढ़ें


US Patent Issued to DISCO on April 14 for "Lift-off method" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,714, issued on April 14, was assigned to DISCO Corp. (Tokyo). "Lift-off method" was invented by Masato Terajima (Tokyo), Junya Mimura (Tok... और पढ़ें